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Influence of deposition parameter on the optical properties of ZnO thin films by dip coating method

机译:沉积参数对浸涂法的ZnO薄膜光学性质的影响

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In this paper, we presented the optical studies of ZnO thin films for different number of layers using wet chemical method, dip coating method. XRD studies confirms the hexagonal wurtzite structure of the films. Optical study reveals that all samples exhibit high transmittance more than 80% in the visible region and optical energy band gap of these films have been calculated between 3.23eV and 3.12eV, which is less than the bulk value of 3.37 eV. PL studies explained the near- band gap emission and deep level emission of ZnO films. Hence, performed optical analysis suggests that ZnO thin films might be suitable for its application in optoelectronic devices such as protective layers, since these films strongly absorb ultraviolet radiations and transmitting visible light.
机译:在本文中,我们使用湿化学方法,浸涂法向不同数量的层呈现了ZnO薄膜的光学研究。 XRD研究证实了胶片的六边形湿度结构。 光学研究表明,在3.23EV和3.12EV之间计算了所有样品在3.23EV和3.12EV之间表现出大于80%的高透射率,并且这些薄膜的光能带隙在3.37eV的散装值下计算。 PL研究解释了ZnO薄膜的近带隙发射和深层排放。 因此,进行的光学分析表明,ZnO薄膜可能适用于其在诸如保护层的光电器件中的应用,因为这些薄膜强烈地吸收紫外线辐射并透射可见光。

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