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Adopting of DC magnetron sputtering method for preparing semiconductor films

机译:采用DC磁控溅射法制备半导体膜

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It has been carried out the experimental studies of the process of cadmium telluride magnetron sputtering with direct current, and the impact of a magnetron sputtering mode on CdTe films crystalline structure. In order to create thin-film solar cells based on cadmium sulfide and telluride CdTe films for the base layers of thin film solar cells was obtained on flexible polyimide substrates by magnetron sputtering with direct current for the first time. It has found that increasing the magnetron discharge current up to 80 mA leads to increase in coherent scattering regions what is due to an increase in the thickness of the cadmium telluride films of the hexagonal modification having a columnar structure.
机译:已经进行了对直流电流的碲化镉磁控溅射的方法的实验研究,以及磁控溅射模式对CdTe膜结晶结构的影响。为了通过磁控溅射通过磁控溅射,在柔性聚酰亚胺基材上通过磁控管溅射首次通过磁控管溅射在薄膜太阳能电池基层获得薄膜太阳能电池和薄膜太阳能电池。已经发现,增加高达80mA的磁控管放电电流导致相干散射区域的增加,这是由于具有柱状结构的六边形修饰的碲化镉膜的厚度的增加。

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