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Monte Carlo study of the early growth stages of 3C-SiC on misoriented <11-20>and <1-100>6H-SiC substrates

机译:Monte Carlo研究了3C-SiC的早期生长阶段,在有吸白的<11-20>和<1-100> 6h-SiC基板上

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In this paper we used three dimensional kinetic Monte Carlo simulations on super-lattices to study the hetero-polytypical growth of cubic silicon carbide polytype (3C-SiC) on hexagonal 6H-SiC substrates with miscuts towards the <11-20> and <1-100> directions. We analyze the grown film for different miscut angles (in the range 2° to 12° degrees) and different growth rates, finding that substrates with miscut of 3-4° degrees towards the <1-100> direction should be the best choice for the growth of high quality cubic epitaxial films, being able to promote, given a suitable pre-growth treatment to induce step bunching, the nucleation of single domain 3C-SiC films.
机译:在本文中,我们在超级晶格上使用了三维动力学蒙特卡罗模拟,研究了立方碳化硅聚丙烯(3C-SiC)对六边形6H-SiC底物的杂多生长,其朝向11-20> <1 -100>方向。我们分析了不同杂片角度的生长薄膜(在2°至12°程度范围内)和不同的生长速率,发现具有3-4°度朝向<1-100的模拟的基材应该是最佳选择高质量的立方外延膜的生长,能够促进合适的预生长处理,以诱导步骤束缚,单结构结构域3C-SiC膜的成核。

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