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Numerical simulation of crystal rotation effect on the solid-liquid interface in the floating-zone (FZ) silicon

机译:浮区(FZ)硅中固液界面晶体旋转效应的数值模拟

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Single crystal silicon with high purity can be produced by FZ method. Without contamination by the crucible, the oxygen concentration in the FZ silicon is low. The striations in the as-grown crystal are caused by the asymmetric electromagnetic (EM) field due to the EM supplier [1]. A. Muhlbauer conducted 2D calculation and compared with experimental results. The discrepancy between calculation and experiment qualitatively shows influence of the asymmetric electromagnetic field on the radial resistivity distribution [2]. To investigate the asymmetric electromagnetic field on the interface, a three dimensional global model has been developed based on the open-source library OpenFOAM. In the numerical simulation, the effect of EM force on the melt flow is considered. The 3D melt flows at free surface under different rotation speeds have been obtained (Figure 1). The interface deflections caused by EM supplier under different rotation speeds are calculated. The calculation results (Figure 2) show that high rotation speed could decrease the deflection of interface caused by the EM supplier.
机译:具有高纯度的单晶硅可通过FZ方法生产。没有坩埚污染,FZ硅中的氧浓度低。由于EM供应商而受到非对称电磁(EM)领域引起的生长晶体的纹章[1]。 A. Muhlbauer进行了2D计算并与实验结果相比。计算和实验之间的差异定性地示出了不对称电磁场对径向电阻率分布的影响[2]。为了研究界面上的不对称电磁场,已经基于开源库OpenFoam开发了三维全局模型。在数值模拟中,考虑了EM力对熔体流动的影响。已经获得了在不同的旋转速度下自由表面的3D熔体流动(图1)。计算EM供应商在不同转速下引起的界面偏转。计算结果(图2)表明,高旋转速度可能会降低由EM供应商引起的界面的偏转。

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