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Current-Voltage Characterization of Gallium Arsenide Nanowires Using a Conductive Atomic Force Microscopy

机译:使用导电原子力显微镜的砷化镓纳米线的电流电压表征

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Utilizing semiconductor nanowires for optoelectronics device requires exact knowledge of their current-voltage properties. In this report, we examine accurate on-top imaging and I-V characterization of individual vertical Gallium Arsenide Nanowires (GaAs NWs) using conductive atomic force microscopy without additional microscopy tools, thus allowing versatile application. The measured current-voltage characteristic of a single NW shows the typical performance of a Schottky contact, which caused by the contact between the metallic AFM tip and the top of NWs. The height of the Schottky barrier is dependent on the diameter of the nanowires. The linear part of the curve was used to calculate the differential resistance, which was found to be about 25 to 100 MΩ. Energy band gap for GaAs NW was found to be 1.5 eV by differential conductivity measurement.
机译:利用半导体纳米线用于光电子装置需要精确地了解其电流 - 电压特性。在本报告中,我们使用导电原子力显微镜检查无需额外显微镜工具,检查各个垂直镓砷纳米线(GaAs NWS)的准确的顶部成像和I-V表征,从而允许多功能应用。单个NW的测量电流 - 电压特性显示了肖特基触点的典型性能,这是由金属AFM尖端和NWS顶部之间的接触引起的。肖特基屏障的高度取决于纳米线的直径。曲线的线性部分用于计算差分电阻,该电阻被发现为约25至100mΩ。通过差动电导率测量,发现GaAs NW的能带隙是1.5eV。

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