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Higher Quantum Efficiency GaAs Photocathode Material with Exponential-doping Structure

机译:具有指数掺杂结构的较高量子效率GaAs光电阴极材料

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To improve the performance of GaAs NEA photocathodes, an exponential-doping structure GaAs material has been put forward, in which from the GaAs bulk-to-surface doping concentration is distributed exponentially from high to low. We apply this exponential-doping GaAs structure to the transmission-mode GaAs photocathodes. This sample was grown on the high quality p-type Be-doped GaAs (100) substrate by MBE. We have calculated the band-bending energy in exponential-doping GaAs emission-layer, and the total band-bending energy is 59 meV which helps to improve the photoexcited electrons movement towards surface for the thin epilayer. The integrated sensitivity of the exponential-doping GaAs photocathode samples reaches 1547uA/lm.
机译:为了提高GaAs Nea光电阴极的性能,已经提出了指数掺杂结构GaAs材料,其中来自GaAs堆积到表面掺杂浓度以高于高于高度的方式分布。我们将该指数掺杂GaAs结构应用于传输模式GaAs光电阴极。通过MBE在高质量的p型掺杂GaAs(100)基板上生长该样品。我们已经计算了指数掺杂GaAs发射层中的带弯曲能量,并且总带弯曲能量为59meV,有助于改善薄膜朝向表面的光屏蔽电子移动。指数掺杂GaAs光电阴极样本的综合灵敏度达到1547ua / lm。

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