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Comparative Electrical Study on n‐Type Cd_(1-X)Se_X and CdSe Thin Films Deposited by Electron Beam Evaporation Technique

机译:电子束蒸发技术沉积的N型CD_(1-X)SE_X和CDSE薄膜的比较电气研究

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Since the last two decades, in the area of electronics, group II‐VI compounds have drawn considerable interest due to their various applications. Cadmium selenide (CdSe), a member of this group, is one of the promising semiconducting material from its application point of view. The n‐type Cd_(1-X)Se_X and CdSe films have been deposited onto ultra cleaned glass substrates by electron bean evaporated technique under 10~(-5)?torr vacuum. The n‐type Cd_(1-X)Se_X thin films has confirmed by Hall effect data. The resistivity of the film has been determined by I‐V measurement using four probe setup. It is observed that the resistivity decreases with increases Cd∕Se ratio and we found that n‐type Cd_(1-X)Se_X thin films is more better than CdSe thin films.
机译:自过去二十年以来,在电子领域,由于各种应用,II-VI族化合物具有相当大的利益。硒化镉(CDSE)是该组的成员,是来自其应用观点的有前途的半导体材料之一。通过10〜(-5)℃的电子豆蒸发技术将N型CD_(1-X)SE_X和CDSE薄膜沉积在超清洁的玻璃基板上。 N型CD_(1-X)SE_X薄膜通过HALL效应数据确认。使用四个探针设置通过I-V测量确定了薄膜的电阻率。观察到,电阻率随着CD / SE的比率而降低,并且我们发现n型CD_(1-x)SE_x薄膜比CDSE薄膜更好。

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