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Synthesis and intrinsic stress of Ti-containing carbon nitride nanocomposite films

机译:含Ti氮化碳纳米复合膜的合成与内在应力

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Titanium containing carbon nitride (CN_X) films are prepared by radio frequency magnetron sputtering method. The evolution of intrinsic stress within the nanocomposite films is monitored during growth by using an in situ bending-plate method. The effect of Ti-containing concentration on intrinsic stress is investigated. XRD data shows that TiN nanocrystals are synthesized to embed into the CN_X matrix. The film intrinsic stress depends obviously on the content of Ti. We suggest that grain boundary effect is responsible to the intrinsic stress variation as a function of the content of Ti.
机译:通过射频磁控溅射方法制备含氮化钛(CN_X)膜。通过使用原位弯曲板法在生长期间监测纳米复合膜内的固有应力的演变。研究了含Ti浓度对内在应力的影响。 XRD数据表明,合成锡纳米晶体以嵌入CN_X矩阵。薄膜内在应力明显取决于Ti的含量。我们建议谷物边界效应是作为Ti含量的函数的固有应力变化。

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