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Synthesis and intrinsic stress of Ti-containing carbon nitride nanocomposite films

机译:含钛氮化碳纳米复合薄膜的合成及内应力

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摘要

Titanium containing carbon nitride (CNX) films are prepared by radio frequency magnetron sputtering method. The evolution of intrinsic stress within the nanocomposite films is monitored during growth by using an in .situ bending-plate method. The effect of Ti-containing concentration on intrinsic stress is investigated. XRD data shows that TiN nanocrystals are synthesized to embed into the CNX matrix. The film intrinsic stress depends obviously on the content of Ti, We suggest that grain boundary effect is responsible to the intrinsic stress variation as a function of the content of Ti.
机译:通过射频磁控溅射方法制备了含钛氮化碳(CNX)膜。通过使用原位弯曲板法在生长期间监测纳米复合膜内固有应力的演变。研究了含钛浓度对固有应力的影响。 XRD数据表明,合成了TiN纳米晶体以嵌入CNX基质中。薄膜的固有应力显然取决于Ti的含量。我们认为晶界效​​应是固有应力随Ti含量变化的原因。

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