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ELECTRON BEAM INJECTED ULTRAHIGH-FREQUENCY PLASMA FOR SUPERIOR PLASMA PROCESSING

机译:电子束注入超高频率等离子体,用于卓越的等离子体加工

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Electron beam injected ultrahigh-frequency (EBUHF) plasma was suggested for the flexible control of the electron energy distribution function (EEDF). By changing the electron beam injection condition, space potential could be changed while electron density and electron temperature were nearly constant. Moreover, it was found that the dissociation ratio in nitrogen EBUHF plasma is increased from 1% (in ultrahigh-frequency plasma) to 3%. Trace rare gas spectroscopy showed that the high-energy tail part of the EEDF could be changed depending on the electron beam injection condition.
机译:建议电子束注入超高频率(EBUHF)等离子体,用于柔性控制电子能量分配功能(EEDF)。通过改变电子束注射条件,可以改变空间电位,而电子密度和电子温度几乎恒定。此外,发现氮气血浆中的解离比率从1%(超高频血浆)增加到3%。痕量稀有气体光谱显示,EEDF的高能尾部可以根据电子束注射条件而改变。

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