Thermochromic VO_2 Thin Films: Growth and Characterization

摘要

Thin films of thermochromic VO_2were stabilized on Si substrate at different deposition parameters by sputtering method and their structural characterization wascarried out using X-ray diffraction technique.Sputtering inAr/O_2gas mixture has resulted in mixed phase growthof VO_2. On the other hand, sputteringwithAronly has resulted in single phase growth of VO_2 thin films. Monoclinic to rutile structural phase transition was studied in the grown VO_2 thin film samples by performing the temperature dependent grazing incidence X-ray diffraction (GIXRD) measurements.