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High Performance GaN/AlGaN Ultraviolet Avalanche Photodiode Detector Technologies

机译:high performance Gan/AL Gan ultraviolet avalanche photodiode detector technologies

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Detection of ultraviolet (UV) bands provides distinct advantages for NASA, defense, and commercial applications, including increased spatial resolution, small pixel sizes, and large format arrays. Al_xGa_(1-x)N semiconductor alloys have attracted great interest for detection in the UV spectral region because of their potential for high optical gain, high sensitivity, and low dark current performance in ultraviolet avalanche photodiodes (UV-APDs). We are developing GaN/AlGaN UV-APDs that demonstrate consistent and reliable UV-APD performance and operation. For these UV detectors we have measured gains of above 5 × 10~6 and high quantum efficiencies at ~350 nm enabled by a strong avalanche multiplication process. These UV-APDs are fabricated through high quality metal organic chemical vapor deposition (MOCVD) growth on lattice-matched, low dislocation density GaN substrates with optimized GaN/AlGaN UV-APD material growth and doping parameters. The high performance, variable-area GaN/AlGaN UV-APD detectors and arrays can be customized to a wide variety of sizes including large-area formats to enable sensing and high-resolution detection over UV bands of interest.
机译:紫外线(UV)带的检测为美国宇航局,防御和商业应用提供了不同的优势,包括增加的空间分辨率,小像素尺寸和大格式阵列。 AL_XGA_(1-X)N半导体合金由于它们在紫外线雪崩光电二极管(UV-APDS)中的高光学增益,高灵敏度和低暗电流性能的可能性而吸引了对UV光谱区域中的检测感到非常兴趣。我们正在开发GaN / AlGaN UV-APD,其展示一致和可靠的UV-APD性能和操作。对于这些UV探测器,我们通过强大的雪崩乘法过程使得在〜350nm的高度为5×10〜6和高量子效率的上升。这些UV-APD通过高质量的金属有机化学气相沉积(MOCVD)生长而在晶格匹配的低位脱位密度GaN基材上具有优化的GaN / AlGaN UV-APD材料生长和掺杂参数。高性能,可变区域GaN / AlGaN UV-APD探测器和阵列可以定制到包括大面积格式的各种尺寸,以实现对紫外线带的感应和高分辨率检测。

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