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Electrical, Optical and Structural Properties of FTO Thin Films Fabricated by Spray Ultrasonic Nebulizer Technique from SnC14 Precursor

机译:来自SNC14前体的喷雾超声波雾化器技术制造的FTO薄膜的电气,光学和结构性能

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Thin films of fluorine-doped tin oxide on glass were prepared by spray ultrasonic nebulizer technique from an economic anhydrous tin (IV) chloride (SnCl_4) precursor.The effect of deposition time on the structural, electrical and optical properties of tin oxide thin films was investigated. This research a purpose to find an optimum deposition time during spray pyrolysis technique in order to produce FTO with the desired characteristics. For this purpose, soda lime glasses are heated at 350 °C on deposition time of 10, 15, 20 and 25 minutes. NH_4F was doped at a ratio of 2 wt% in the SnCl_4 precursor and methanol solvent. The results revealed that longer deposition times created decreased the electrical resistivity and optical transmittance of FTO layers. The highest optical transmittance was 84.808% and the lowest resistivity was 4.01×10~(-5) ?.cm, obtained from FTO glass subjected to a 15-minute deposition time at deposition temperature of 350 °C. This is accordance to the TCO conductive glass requirements for the minimum resistivity value on scale 10~(-4) ?.cm and optical transmittance value of 80-85%.
机译:通过从经济无水锡(IV)氯化物(SNCL_4)前体喷雾超声雾化器技术制备玻璃上氟掺杂氧化锡的薄膜。沉积时间对氧化锡薄膜结构,电和光学性质的影响调查。该研究目的是在喷雾热解技术期间找到最佳沉积时间,以产生具有所需特性的FTO。为此目的,苏打石灰玻璃在350℃下在10,15,20和25分钟的沉积时间内加热。在SnCl_4前体和甲醇溶剂中以2wt%的比例掺杂NH_4F。结果表明,创造的较长沉积时间降低了FTO层的电阻率和光学透射率。最高光学透射率为84.808%,最低电阻率为4.01×10〜(-5)〜.cm,从FTO玻璃获得,在沉积温度为350℃的沉积温度下进行15分钟的沉积时间。这是根据TCO导电玻璃要求的最小电阻率值10〜(-4)?.cm和光学透射率值80-85%。

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