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N- and P- type Doping in Al-rich AlGaN and AlN

机译:在富含al的Algan和Aln中的n-和p型掺杂

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Attaining a high conductivity in both p-type and n-type Al-rich AlGaN epitaxial films is necessary for highly efficient deep-UV emitters. While reliable n-type conductivity has been demonstrated in Al_xGa_(1-x)N up to x < 0.8, achieving a reasonable p-type conductivity is a challenge even in Ga-rich AlGaN films. As one increases the x in Al_xGa_(1-x)N, several point defects and charge compensators appear in the epitaxial film. This report reviews recent observations on doping, conductivity, point defect control of Al-rich AlGaN films. Discussions on activation energy, state-of-the-art epitaxial material quality, contact formation and surface treatments are also presented.
机译:高效的深紫色发射器是必需的P型和N型型Al-γ的AlGaN外延膜中的高导电性。虽然在AL_XGA_(1-x)N中,可靠的N型导电性高达X <0.8,但即使在GA富含GA的AlGAN薄膜中,也可以实现合理的p型电导率是挑战。随着一个增加Al_xga_(1-x)n中的x,在外延薄膜中出现若干点缺陷和充电补偿器。本报告评论最近关于掺杂,电导率,点缺陷控制的富含铝的AlGaN薄膜的观察。还提出了关于激活能量,最先进的外延材料质量,接触形成和表面处理的讨论。

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