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Numerical estimates of metal atom energy in reactive sputter deposition of TiN and TaN thin films

机译:锡和棕褐色薄膜反应溅射沉积金属原子能的数值估计

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In this study, a model was proposed for the energy transfer from the sputtered Ti and Ta atoms to the background gases in Ar and N2 mixtures. For elastic collisions, an energy-dependent Lennard-Jones radius was used. For inelastic collisions, the excitation cross sections for heavy Ti and Ta atoms were based on the scaling of the corresponding electron impact cross sections. Under typical low pressure sputtering conditions, the average energy and the energy distribution of the Ti and Ta atoms were calculated with the collision number. The calculated average energy and mean free path of the Ti and Ta atoms leaving the target are over 20 eV and 12 cm, respectively. The metal atoms reach equilibrium with the background gas at about 2 to 3 times the thermal speed. The elastic energy transfer dominates over the inelastic transfer and the model could be simplified to elastic only.
机译:在本研究中,提出了一种模型,用于将溅射的Ti和Ta原子从溅射的Ti和Ta原子转移到Ar和N 2混合物中的背景气体。对于弹性碰撞,使用了能量相关的Lennard-Jones半径。对于非弹性碰撞,重型Ti和Ta原子的激发横截面基于相应的电子撞击横截面的缩放。在典型的低压溅射条件下,用碰撞数计算Ti和Ta原子的平均能量和能量分布。将留下靶的Ti和Ta原子的计算的平均能量和平均自由路径分别超过20eV和12cm。金属原子达到热速度约2至3倍的背景气体平衡。弹性能量转移在非弹性转移上占主导地位,并且可以简化模型仅适用于弹性。

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