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Improvement of the cavitation erosion resistance for Cr3Si film on stainless steel by double cathode glow discharge

机译:通过双阴极辉光放电改善CR3SI膜对CR3SI薄膜的空化蚀阻

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In this study, sputter-deposited Cr3Si film was prepared by double cathode glow discharge (DCGD) technique onto 304 stainless steel. The phase constituents, surface microstructure and chemical compositions of the film were examined by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). After the DCGD process, the hardness of Cr3Si film was 26 GPa, about 10 times of the stainless steel, 2.5 GPa. The cavitation erosion resistance of Cr3Si film and stainless steel were investigated by using an ultrasonic vibration cavitation erosion system. After 30 hours of cavitation tests, the cumulative mass loss of Cr3Si film was only 60% of the stainless steel. Compared with the untreated stainless steel, the cavitation erosion resistance of Cr3Si film was improved. The cavitation mechanism of Cr3Si film is due to the delamination and spalling of local surface layer derived from its inherent brittleness.
机译:在该研究中,通过双阴极辉光放电(DCGD)技术在304不锈钢上制备溅射沉积的CR3SI膜。通过使用X射线衍射(XRD),扫描电子显微镜(SEM)和透射电子显微镜(TEM)来检查膜的相成分,表面微观结构和化学组成。在DCGD过程之后,CR3SI膜的硬度为26gPa,约10倍的不锈钢,2.5GPa。采用超声波振动腐蚀系统研究了CR3SI薄膜和不锈钢的空化蚀阻。 30小时后的空化试验后,CR3SI薄膜的累积质量损失仅为不锈钢的60%。与未处理的不锈钢相比,改善了CR3SI薄膜的空化蚀阻。 CR3SI膜的空化机构是由于源自其固有脆性的局部表面层的分层和剥落。

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