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Analog Performance of Dual- Metal Gate Stack Architecture of Junctionless Accumulation-Mode Cylindrical Surrounding Gate (DMGSA-JAM-CSG) MOSFET

机译:无连接累积模式圆柱围栏双金属栅极堆叠架构的模拟性能(DMGSA-CAM-CSG)MOSFET

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摘要

This paper analyses a refined edition of Junctionless Accumulation Mode (JAM) MOSFET, i.e., Dual- Metal Gate Stack Architecture of JAM Cylindrical Surrounding Gate (DMGSA- JAM- CSG) MOSFET. In this device, use of dual metal gates and a high-k gate stack is leading towards the enhancement of the device’s performance. Simulation of this device has been accomplished and the results are also compared with JAM-CSG MOSFET. It is seen that this device possesses improved characteristics, i.e., increased drain current, higher transconductance, lower output conductance, improved intrinsic gain and early voltage, high Ion/Ioff ratio and reduced subthreshold slope. Thus, the overall performance of the device is much better and therefore is more capable for high gain amplifier and high speed switching applications. The simulation has been conducted on ATLAS 3-D device simulator.
机译:本文分析了堵塞圆柱圆柱围栏(DMGSA-COM-CSG)MOSFET的二元金属栅极堆叠架构的结合累积模式(JAM)MOSFET的精致版。在该装置中,使用双金属门和高k门堆的使用导致设备性能的增强。已经完成了该设备的仿真,并将结果与​​JAM-CSG MOSFET进行了比较。可以看出,该装置具有改进的特性,即漏极电流增加,跨导,较低的输出电导,提高的内在增益和早期电压,高于I上/一世关闭 比率和减少的亚阈值斜率。因此,该设备的整体性能要好得多,因此高增益放大器和高速切换应用更有能力。已经在ATLAS 3-D设备模拟器上进行了模拟。

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