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Polymer films for laser-structured circuit carriers

机译:用于激光结构电路载体的聚合物膜

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Nowadays the most valued process to apply circuitries on Molded Interconnect Devices (MID) is the LPKFLDS (laser-direct-structuring) technology with an increasing amount of applications in various branches. Main advantage of this process is the high flexibility of laser processing three dimensional circuitries. Moreover, fine layout structures can be achieved by using a minimized laser spot. Therefore, the matrix polymer is filled with a special additive, enabling laser activation and sufficient metallization. To further improve the metallization quality and the coefficient of thermal expansion, high contents of inorganic fillers are added to the matrix polymer. However, this results in a low elongation at break, making the materials brittle. This is a major challenge especially for thin walls and films. In the present paper the potential for using films in combination with the LPKF-LDS process is considered for a use in flexible circuit carriers or for backmolding applications. Therefore, the content of talc in the polymer matrix is successively increased to determine the required minimum for appropriate metallization results. The compounds are extruded to films of different thicknesses. Using a Chill-Roll-Unit, one side of the films is smoothed. The films are structured, using different laser parameters and metallized, whereas these areas are investigated and evaluated using light microscopy and scanning electron microscopy. Furthermore, the plating thickness is measured as well as the roughness of the untreated samples. The metal deposition of the films is also compared to injection molded samples, especially regarding the surface structure. It can be shown, that an increasing amount of talc improves the plating thickness in contrast to poor metal deposition adding only LDS additive. The different surface structures of the Chill-Roll- Side and untreated side show no significant influence on the plating results. The achieved plating thickness seems comparable to injection molded parts of the same material.
机译:如今,在模制互连器件(中间)上应用电路的最有价值的过程是LPKFLD(激光直接结构)技术,各种分支中的应用量增加。该过程的主要优点是激光加工三维电路的高灵活性。此外,可以通过使用最小化激光斑来实现细小的布局结构。因此,基质聚合物用特殊添加剂填充,使激活激活和充足的金属化。为了进一步提高金属化质量和热膨胀系数,将高含量的无机填料添加到基质聚合物中。然而,这导致断裂伸长率低,使材料脆弱。这是薄壁和电影的主要挑战。在本文中,考虑使用与LPKF-LDS工艺组合使用薄膜的电位用于柔性电路载体或用于背形应用。因此,连续增加了聚合物基质中滑石的含量以确定适当的金属化结果的最低要求。将化合物挤出到不同厚度的薄膜。使用冷却辊单元,平滑薄膜的一侧。使用不同的激光参数和金属化构造薄膜,而使用光学显微镜和扫描电子显微镜研究这些区域。此外,测量镀层厚度以及未处理样品的粗糙度。还将膜的金属沉积与注塑样品进行比较,特别是关于表面结构。可以示出,增加的滑石量改善了与差的金属沉积相比仅添加LDS添加剂的镀层厚度。冷却辊侧和未处理的侧面的不同表面结构显示对电镀结果没有显着影响。实现的电镀厚度似乎与相同材料的注塑部件相当。

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