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Electrical Properties of Cr-doped Sb_2Te_3 Phase Change Material

机译:CR掺杂SB_2TE_3相变材料的电性能

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Phase Change Memory (PCM) is regarded as one of the most promising candidates for the next-generation nonvolatile memory. Its storage medium, phase change material, has attracted continuous exploration. Sb_2Te_3 is a highspeed phase change material matrix with low crystallization temperature. Cr-doped Sb_2Te_3 (CST) films with suitable composition have been studied and proved to be a promising novel phase change material with high speed and good thermal stability. In this paper, detailed R_s-T characteristics and Hall characteristics of the CST films are studied. We find that, when more parts of the film crystallizes into the ordered structure, the activation energy for electrical conduction (E_σ) decreases, indicating that the semiconductor property is weakened. And with the increase of Cr-dopants, E_σ of the As-deposited (As-de) amorphous CST films decreases, thus the thermal stability of resistance is improved. Hall results show that Sb_2Te_3 and CST films are all in P-type. For As-de amorphous films, with the increase of Cr-dopants, the carrier mobility decreases all along, while the carrier density decreases at first and then increases. For the crystalline films, with the increase of Cr-dopants, the carrier mobility decreases, while the carrier density increases.
机译:相变内存(PCM)被视为下一代非易失性存储器最有希望的候选者之一。其存储介质相变材料吸引了连续探索。 SB_2TE_3是具有低结晶温度的高速相变材料矩阵。已经研究了具有合适组合物的CR掺杂的SB_2TE_3(CST)膜,并证明是具有高速和良好热稳定性的有前途的新型相变材料。本文研究了CST薄膜的详细R_S-T特性和霍尔特性。我们发现,当薄膜的更多部分结晶到有序结构中时,用于导电(E_σ)的激活能量降低,表明半导体性能被削弱。随着Cr掺杂剂的增加,沉积的(AS-DE)无定形CST膜的E_σ降低,因此抗性的热稳定性得到改善。霍尔结果表明,SB_2TE_3和CST薄膜都处于p型。对于AS-DE非晶膜,随着CR掺杂剂的增加,载流子迁移率一下,而载流子密度首先降低,然后增加。对于结晶膜,随着Cr掺杂剂的增加,载流子迁移率降低,而载流子密度增加。

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