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Regularities of Structure and Phase Composition Formation of Surface Layer of Silumin Subjected to Electron-Beam Treatment

机译:经受电子束处理的硅胶表面层的结构和相位组成的规律

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It has been shown that electron beam treatment of silumin is accompanied by the formation of multilayer submicro-and nanocrystalline structure and result in increasing the microhardness of the surface layer (towards the core) is ~ 1.5 Times up to 2 GPa. Investigation of cross-sections of the samples also showed an increase of microhardness of the surface layers up to 50 μm and 70 μm under the best conditions of irradiation on "GEZA-1" setup and "SOLO" setup respectively.
机译:已经表明,硅粉的电子束处理伴随着多层亚亚晶和纳米晶体结构的形成,导致表面层的微硬度(朝向核心)增加〜1.5倍,最多2GPa。样品横截面的研究还表明,在“Geza-1”设置和“独奏”设置上的最佳照射条件下,表面层的微硬度增加到50μm和70μm。

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