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Effect of Oxygen Vacancy on Half Metallicity in Ni-doped CeO_2 Diluted Magnetic Semiconductor

机译:氧气空位对Ni掺杂CeO_2稀磁半导体中半金属性的影响

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The electronic and magnetic properties of Ni-doped CeO_2 diluted amgentic semiconductor (DMS) including the effect of oxygen vacancy (V_o) with doping concentration, x = 0.125 have been calculated using FPLAPW method based on Density Functional Theory (DFT) as implemented in WIEN2k. In the present supercell approach, the XC potential was constructed using GGA+U fo rmalism in which Coulomb correction is applied to standard GGA functional within the parameterization of Perdew-Burke-Ernzerhof (PBE). We have found that the ground state properties of bulk CeO_2 compound have been modified significantly due to the substitution of Ni-dopant at the cation (Ce) site with/without Vo and realized that the ferromagnetism in CeO_2 remarkably depends on the V_o concentrations. The presence of V_o, in Ni-doped CeO_2, can leads to strong ferromagnetic coupling between the nearest neighboring Ni-ions and induces a HMF in this compound. Such ferromagnetic exchange coupling is mainly attributed to spin splitting of Ni-d states, via electrons trapped in V_o. The HMF characteristics of Ni-doped CeO_2 including V_o makes it an ideal material for spintronic devices.
机译:镍掺杂的氧化铈的电子和磁性稀释amgentic半导体(DMS),包括氧空位(V_O)与掺杂浓度的影响,X = 0.125使用基于密度泛函理论FPLAPW方法(DFT)已经被计算为WIEN2k实现。在本超级方法,使用GGA + U FO其中库仑校正应用于标准GGA Perdew-伯克Ernzerhof(PBE)的参数内的功能rmalism构建了XC潜力。我们已经发现,氧化铈散装化合物的基态性质已经由于镍掺杂剂在与/阳离子(Ce)的网站,而VO取代显著改性和认识到,在氧化铈的铁磁性显着地依赖于V_O浓度。 V_O的存在下,在镍掺杂的氧化铈,可以引线到最近的相邻的Ni离子和诱导该化合物一个HMF之间的强铁磁性耦合。这种铁磁交换耦合主要归因于镍-d的状态中的自旋分裂,通过捕获在V_O电子。镍掺杂的氧化铈包括V_O的HMF特性使其成为自旋电子器件的理想材料。

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