Electron beam written subwavelength gratings for polarization separation in the infrared

摘要

The design and fabrication of transmission subwavelength binary gratings for operation as polarizing beam splitters (PBSs) at 1550 nm is presented in this paper. An analytical method called the modal method was used for the design as well as to predict the efficiencies of the polarization components in each order. Electron beam lithography has been employed to fabricate the subwavelength grating structures on poly methyl methacrylate (PMMA). The performance of the fabricated PBS has been evaluated by optical testing.