Stitching Error Reduction in Electron Beam Written Gratings

机译：电子束写入光栅中的拼接错误减少

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摘要

A multiple-write electron beam lithography techniques is described as linear filter on the grating spatial frequency spectrum.

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作者
Dougherty, D.; Muller, R.; Maker, P.; Mansour, K.; Chacon, R.; Qiu, Y.; Young, M.; Forouhar, S.;
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年度 2000
页码 1-3
总页数 3
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
ELECTRON BEAMS; ERRORS; FREQUENCY DISTRIBUTION; LINEAR FILTERS; LITHOGRAPHY; SEMICONDUCTOR LASERS; electron beam lithography gratings stitching error semiconductor lasers;

机译：电子束;错误;频率分布;线性滤波器;印刷;半导体激光器;电子束光刻光栅拼接误差半导体激光器;

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专利

1. Multiple-beam interference lithography with electron beam written gratings [J] . H. H. Solak, C. David, J. Gobrecht, Journal of Vacuum Science & Technology. B, Microelectronics Processing and Phenomena . 2002,第6期

机译：电子束写入光栅的多光束干涉光刻
2. Electron-beam lithography for photonic waveguide fabrication: Measurement of the effect of field stitching errors on optical performance and evaluation of a new compensation method [J] . Alexei L. Bogdanov, Jean Lapointe, Jens H. Schmid Journal of Vacuum Science & Technology . 2012,第3期

机译：用于光子波导制造的电子束光刻：场拼接误差对光学性能的影响的测量和新补偿方法的评估
3. The effect of stitching errors on the spectral characteristics of DFB lasers fabricated using electron beam lithography [J] . Kjellberg T., Schatz R. Journal of Lightwave Technology . 1992,第9期

机译：拼接误差对使用电子束光刻技术制造的DFB激光器的光谱特性的影响
4. Essential reduction of stitching errors in electron-beam lithography using a multiple exposure technique [C] . Ralf Steingrueber, Herbert Engel, Werner Lessle Conference on Emerging Lithographic Technologies Ⅴ Feb 27-Mar 1, 2001, Santa Clara, USA . 2001

机译：使用多重曝光技术可大幅减少电子束光刻中的缝合误差
5. Error reduction by combining strapdown inertial measurement units in a baseball stitch. [D] . Tracy, Leah. 2014

机译：通过将捷联惯性测量单元组合到棒球针中来减少错误。
6. Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask [O] . Dakui Lin, Zhengkun Liu, Kay Dietrich, -1

机译：使用电子束光刻写入的相位掩模通过近场全息术制造的软X射线变化线间隔光栅
7. MULTIPLE-BEAM INTERFERENCE LITHOGRAPHY WITH ELECTRON BEAM WRITTEN GRATINGS [O] . H. H. Solak, B. Steinacher, C. David, 2008

机译：电子束手写光栅的多光束干涉光刻
8. Stitching-error reduction in gratings by shot-shifted electron-beam lithography [R] . Dougherty, D. J., Muller, R. E., Maker, P. D., 2001

机译：通过镜头移位电子束光刻减少光栅中的拼接错误

Stitching Error Reduction in Electron Beam Written Gratings

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