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Characterization of Be Deposits on Mo, W and Cu Substrates, to Implement in a Neutron Production Target for Accelerator-based Boron Neutron Capture Therapy

机译:在Mo,W和Cu基板上沉积的表征,在基于加速器的硼中子捕获疗法中的中子生产靶标中实施

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The generation of neutrons through nuclear reactions like Be(d,n), necessary to implement Accelerator-Based Boron Neutron Capture Therapy (AB-BNCT), requires stable Be deposits on an adequate substrate. In this paper, first results of beryllium deposits on Mo, W and Cu substrates are shown. In order to achieve the adhesion of the deposits on the different substrates, powder blasting tests under different conditions were made. On the other hand, silver deposits were made on some of the samples, previously blasted, to favor the chemical affinity between beryllium and the substrate thus improving adhesion, Knowles and Hazlett (1970). Beryllium deposits, on these previously treated substrates, were produced using the Physical Vapor Deposition (PVD) technique. Once Be was successfully deposited a film of 10.0 ±1.2 μm thickness was obtained. The roughness of substrates and of the beryllium film was determined, showing a mean value of 1.4 urn, 1.1 μm and 2.1 μm for Mo, W and Cu (ofhc) substrates, respectively. To study temperature effect on deposits, a thermal treatment was performed under brazing temperature conditions. Subsequently, deposits were characterized by means of different techniques including XR diffraction and Electron Microscopy (SEM).
机译:通过核反应产生中子,如(d,n),必须实施加速器的硼中子捕获疗法(ab-bnct),需要稳定地沉积在足够的基材上。在本文中,示出了在Mo,W和Cu基板上的第一个铍沉积物的结果。为了实现沉积物对不同底物上的粘附,制备不同条件下的粉末喷砂试验。另一方面,在一些样品上制备银沉积物,以利用铍和底物之间的化学亲和力,从而改善粘附,有人知和Hazlett(1970)。使用物理气相沉积(PVD)技术生产在这些先前经过的底物上的铍沉积物。一旦成功地沉积,获得了10.0±1.2μm厚度的薄膜。测定底物和铍膜的粗糙度,分别为Mo,W和Cu(OFHC)底物的平均值为1.4瓮,1.1μm和2.1μm。为了研究对沉积物的温度效应,在钎焊温度条件下进行热处理。随后,通过包括XR衍射和电子显微镜(SEM)的不同技术表征沉积物。

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