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New rotatabie magnetrons and target materials:Enabling higher performance sputter coatings

机译:新的Rotatabie磁控管和目标材料:使更高的性能溅射涂料

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摘要

Sputter coating of high quality layers and stacks on flexible polymer substrates is of growing interest for a wide portfolio of high-end applications. Realizing the desired combination of optical, electrical and mechanical layer properties while sustaining long term stable, uniform and high yield deposition processes puts stringent requirements on magnetron and target material quality. The rotatabie magnetron technology and cylindrical target materials have evolved significantly and may offer unique capabilities for achieving these performance expectations.
机译:高质量层的溅射涂层和柔性聚合物基材上的堆叠对于广泛的高端应用组合来说是越来越关注的。实现光学,电和机械层性能的所需组合,同时维持长期稳定,均匀和高收益沉积工艺对磁控管和目标材料质量的严格要求。 Rotatabie磁控管技术和圆柱形目标材料显着发展,可提供实现这些性能预期的独特功能。

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