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Progress in SiC MOSFET Reliability

机译:SIC MOSFET可靠性的进展

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Bias-temperature stress experiments performed on two generations of SiC power MOSFETs from the same manufacturer show reductions in threshold voltage (V_T) shift at elevated temperatures from first- to second-generation. The negative V_T shift is reduced from a range of-1 V to -1.6 V to a range of-100 mV to -300 mV for temperatures from 125°C to 175°C. Plastic-packaged parts show a gate-bias-independent junction leakage current at temperatures above the rated temperature, suggesting that the plastic packaging introduces an extrinsic leakage path. Junction leakage in metal-packaged parts can be significantly reduced by applying a small negative gate bias at elevated temperatures. Switching gate bias temperature stresses show V_T shifts dependent on duty cycle, with a higher duty cycle resulting in a higher rate of V_T shift. Cumulative damage effects may be observed between switching gate bias stresses.
机译:在来自相同制造商的两代SiC功率MOSFET上进行的偏置温度应力实验显示从第一到第二代的阈值电压(V_T)偏移的阈值电压(V_T)偏移的换档。负V_T偏移从-1V至-1.6V的范围减小到-100mV至-300mV的范围,对于125°C至175°C的温度。塑料封装件在额定温度高于高于额定温度的温度下,栅极偏置无关的结漏电流,表明塑料包装引入外在泄漏路径。通过在升高的温度下施加小负栅极偏压,可以显着降低金属包装部件中的结泄漏。切换栅极偏置温度应力显示依赖于占空比的V_T移位,具有更高的占空比,导致更高的V_T偏移率。切换栅极偏压应力之间可以观察到累积损伤效果。

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