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Phase Transition Behaviors and Thermal Conductivity of Ge Doped Sb_2Te Thin Films for Phase-Change Random Access Memory

机译:GE掺杂SB_2TE薄膜的相变行为和热导率进行相变随机存取存储器

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The Ge doped Sb_2Te thin films (Ge2Sb_2Te_5, Ge_(0.15)Sb_2Te and Ge0.61Sb_2Te) were deposited by magnetron co-sputtering using Ge and Sb_2Te targets. Ge doping effect on the phase transition behaviors and thermal conductivity of the composite films was investigated. Ge_(0.61)Sb_2Te thin films have higher crystallization temperature (~200°C), larger crystallization activation energy (~3.28 eV), better data retention(~120.8°Cfor 10 years) and lower thermal conductivity (~0.23 W/mK). Ge_(0.61)Sb_2Te thin films is considered to be a promising storage medium for phase change random access memory due to its better thermal stability and lower power consumption.
机译:使用GE和SB_2TE靶通过磁控管共溅射沉积GE掺杂的SB_2TE薄膜(GE2SB_2TE_5,GE_(0.15)SB_2TE和GE0.61SB_2TE)。研究了对复合薄膜的相变行为和热导率的Ge掺杂效应。 GE_(0.61)SB_2TE薄膜具有更高的结晶温度(〜200°C),较大的结晶激活能量(〜3.28eV),更好的数据保留(〜120.8°CFor 10岁)和较低的导热率(〜0.23W / mk) 。 GE_(0.61)SB_2TE薄膜被认为是相位变化随机存取存储器的有希望的存储介质,由于其更好的热稳定性和较低的功耗。

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