Pulsed UV Laser Annealing of Polycrystalline CdTe

摘要

Presented here are the results of a three dimensional, finite element simulation that models pulsed, ultraviolet (UV) laser annealing of polycrystalline CdTe. The model considers heat generated by the absorption of a 25 ns, 248 nm laser pulse normally incident to a 5 μm thick CdTe thin film deposited on a polycrystalline alumina substrate. In particular, focus is on the spatial and temporal distribution of temperature from laser fluences that achieve a sub-melting condition. The model shows that there are very large temperature gradients both in depth and in-plane directions. These predictions, as well as the onset of melting, are confirmed with cross sectional scanning electron microscopy. Additionally, the model predicts that the heat generated dissipates rapidly after the pulse has ended. This has implications if pulse trains are to be used experimentally.