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Current-Voltage and Capacitance-Voltage characteristics of Pd Schottky diodes fabricated on ZnO grown along Zn-and O-faces

机译:沿Zn-and O-Face生长的ZnO制造的PD肖特基二极管的电流电压和电容 - 电压特性

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Temperature dependent current-voltage (I-V) and capacitance-voltage (C-V) measurements were utilized to understand the transport mechanism of Pd Schottky diodes fabricated on Zn-and O-faces of ZnO. From I-V measurements, in accordance with the thermionic emission mechanism theory, it was found that the series resistance Rs and the ideality factor n were strongly temperature dependent that decreased with increasing temperature for both the faces (Zn and O-face) of ZnO revealing that the thermionic emission is not the dominant process. The barrier height ф_B(I-V) increased with increasing temperature for both faces. The measured values of ideality factor, barrier height and series resistance for Zn-and O-faces at room temperature were 4.4, 0.60 eV, 217 Ω and 2.8, 0.49 eV, 251 Ω respectively. The capacitance-voltage (C-V) measurements were used to determine the doping concentration N_d, the built-in-potential V_(bi) , and the barrier height ф_B(C-V). The doping concentration was found to be decreased with increasing depth. The barrier height Φ_B(C-V) calculated for O-polar and Zn-polar faces decreases with increasing temperature. The values of barrier height ф_B(C-V) determined from C-V measurements were found higher than the values of barrier height ф_B(I-V).Keeping in view the calculated values of ideality factor, barrier height, and series resistance shows that O-polar face is qualitatively better than Zn-polar face.
机译:温度相关的电流 - 电压(I-V)和电容 - 电压(C-V)测量以了解在ZnO和O形面上制造的PD肖特基二极管的传输机制。根据IV测量,根据热离子发射机制理论,发现串联电阻Rs和理想因子N强烈依赖性,随着ZnO的脸(Zn和O形)的温度而增加,ZnO的温度越来越低热离子发射不是主导过程。屏障高度Ф_B(I-V)随着两面温度的增加而增加。在室温下为Zn-and的理想因子,屏障高度和串联电阻的测量值分别为4.4,0.60eV,217Ω和2.8,0.49eV,251Ω。电容 - 电压(C-V)测量用于确定掺杂浓度N_D,内置电位V_(BI)和屏障高度Ф_B(C-V)。发现掺杂浓度随着深度的增加而降低。对于O-极性和Zn-极性面计算的阻挡高度φ_B(C-V)随着温度的增加而降低。从CV测量确定的屏障高度Ф_B(CV)的值高于屏障高度Ф_b(iv).Keephing的值,视图的理想因子,屏障高度和串联电阻的计算值表明O-极性面定性比Zn-极性面孔更好。

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