Effect of additives in alkaline solution for cleaning process of a N-polar GaN surface – (PPT)

摘要

Particles and surface roughness should be controlled during N-polar GaN surface cleaning process for fabrication of high quality GaN. Optimization of N-polar GaN surface cleaning process, SDS absorbed on surface formed highly negative charge on N-polar GaN surface: Higher negative zeta-potential, lower etch rate & roughness change. High PRE was achieved at pH 10 with 5 mM SDS MS cleaning for 10 min (PRE: > 99%, ΔRq: < 0.1 nm)