Measurement of Hydroxyl Radicals in Wafer Cleaning Solutions Irradiated with Megasonic Field (PPT)

机译：用兆型磁场照射晶圆清洗液中羟基自由基的测量（PPT）

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Introduction Key Objective and Approach Experimental Methods Principle of Fluorescence Spectroscopy Megasonic Systems and Experimental Procedure Results and Discussion Immersion Meg System Single Wafer Meg System Summary

机译：简介关键目标和方法实验方法荧光光谱型兆系统的原理及实验程序结果与讨论沉浸式梅格系统单晶片MEG系统概要

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《SEMATECH Surface Preparation and Cleaning Conference》|2013年||共19页
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Manish Keswani; Srini Raghavan; Raj Govindarajan;
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中图分类工程材料学;
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1. Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves [J] . M. Keswani, S. Raghavan, R. Govindarajan, Microelectronic Engineering . 2014,第apra期

机译：超声波清洗晶片清洗液中的羟基自由基的测量
2. Role of ammonia and carbonates in scavenging hydroxyl radicals generated during megasonic irradiation of wafer cleaning solutions [J] . Rajesh Balachandran, Mingrui Zhao, Bingfeng Dong, Microelectronic Engineering . 2014,第nova期

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3. Evaluation of very dilute alkaline solutions for wafer cleaning with megasonic irradiation [J] . Jeong J.-H., Kang B.-K., Kim M.-S., Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2013,第Null期

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4. Measurement of Hydroxyl Radicals in Wafer Cleaning Solutions Irradiated with Megasonic Field (PPT) [C] . Manish Keswani, Srini Raghavan, Raj Govindarajan SEMATECH Surface Preparation and Cleaning Conference . 2013

机译：用兆型磁场照射晶圆清洗液中羟基自由基的测量（PPT）
5. Megasonic cleaning of wafers in electrolyte solutions: Possible role of electro-acoustic and cavitation effects [D] . Keswani, Manish 2008

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6. Chemical repair activity of free radical scavenger edaravone: reduction reactions with dGMP hydroxyl radical adducts and suppression of base lesions and AP sites on irradiated plasmid DNA [O] . Kuniki Hata, Ayumi Urushibara, Shinichi Yamashita, 2015

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7. MEGASONIC CLEANING OF WAFERS IN ELECTROLYTE SOLUTIONS: POSSIBLE ROLE OF ELECTRO- ACOUSTIC AND CAVITATION EFFECTS [O] . Keswani Manish, Manish Keswani, Copyright Manish Keswani 2016

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8. Development of Megasonic Cleaning for Silicon Wafers [R] . Mayer, A. 1980

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Measurement of Hydroxyl Radicals in Wafer Cleaning Solutions Irradiated with Megasonic Field (PPT)

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