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Preparation and Physical Properties of CdSe Semiconductor Films by Ultrasonic Chemistry Method

机译:超声化学法制备CDSE半导体膜的制备与物理性质

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CdSe films have been prepared successfully by an ultrasonic chemical bath method, with CdCl_2?2.5H_2O and Na_2SeSO_3 as precursors, and trisodium citrate as complexing agent. The films were characterized by XRD, AFM, and UV-Vis. The results showed that the CdSe films were n-type semiconductor and had absorption in the visible region. The CdSe film electrode had higher electron transfer rate, which leads to a substantial improvement on the photocurrent. Optimal condition for preparing the CdSe thin films were as following: the ratio of Cd~(2+) to trisodium citrate was 1:1.5, the ratio of Cd~(2+) to Se~(2+) was 2.5:1, the pH value was 10, the deposition time was 2.5h, and the annealing temperature was 350°C.
机译:CDSE薄膜由超声波化学浴方法成功制备,用CDCl_2?2.5H_2O和NA_2SESO_3作为前体,以及柠檬酸三钠作为络合剂。薄膜的特征在于XRD,AFM和UV-Vis。结果表明,CDSE膜是N型半导体,并在可见区域中吸收。 CDSE薄膜电极具有更高的电子转移率,这导致光电流的显着改善。制备CDSE薄膜的最佳条件如下:Cd〜(2+)与柠檬酸三钠的比例为1:1.5,Cd〜(2+)至Se〜(2+)的比例为2.5:1, pH值为10,沉积时间为2.5H,退火温度为350℃。

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