Zinc Oxide Film Deposition by Atmospheric Thermal Plasma CVD using Vortex Ar Plasma Jet

摘要

In this study, a nozzle producing vortex Ar plasma jet was fabricated to deposit uniform Zinc oxide film by atmospheric thermal plasma chemical vapor deposition (TPCVD). With the vortex jet, feedstock can combust for a relatively long time and can be vaporized uniformly. It was proved that ZnO dominant zinc oxide films could be deposited on the condition of 673K in deposition temperature. Besides, these films were proved to have enough photo-catalytic property to decolor the methylene blue droplets with 24 hour UV irradiation.