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Ferroelectricity of PZT-based Thin Films Doped with Mn and Nb

机译:基于PZT的薄膜铁电性掺杂有Mn和Nb的薄膜

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The ternary compound thin films doped with Mn and Nb, Pb(Mn1/3,Nb2/3)O_3-PbZrO_3-PbTiO_3(PMnN-PZ-PT), with the same ratio of PZ/PT=52:48(PZT(52/48)) are fabricated on the heterostructure substrates of SrRuO_3(SRO)/Pt(111)/Ti/SiO_2/Si(100) by the radio frequency (RF) magnetron sputtering system, in which the quench method is used for the post heat treatments. The ternary compound films exhibit polycrystal phase combined with (001), (101) and (111) orientations with the 6% mole percent mixing ratio of PMnN, in which the (111) directions are the main orientations for non-mixed PZT(52/48) films and 6% mole percent PMnN mixing PZT(52/48) films(6%PMnN-94%PZT(52/48)), and so both of them are epitaxially grown on Silicon substrates with the (111) orientation. The ferroelectricities of the films are studied by the Sawyer Tower circuit, and the results show that the mixing of PMnN seriously improves the ferroelectricities of PZT(52/48), in which the 6% mixed PZT films own the rest polarization intensity p_r = 23.7μC/m~2, the saturation polarization intensity p_s = 40μC/m~2 and the coercive electric-field intensity E_c =139 kV/cm which are distinctly larger than the non-mixed PZT(52/48) films
机译:掺杂有Mn和Nb,Pb(Mn1 / 3,Nb2 / 3)O_3-PBZRO_3-PBTIO_3(PMNN-PZ-PT)的三元化合物薄膜,PZ / Pt = 52:48(PZT(52通过射频(RF)磁控溅射系统在SRRUO_3(SRO)/ Pt(111)/ Ti / Ti / SiO_2 / Si(100)的异质结构基板上制造,其中淬火方法用于柱子热处理。三元化合物膜与(001),(101)和(111)取向与PMNN的6%混合比相结合,其中(111)方向是非混合PZT的主要取向(52 / 48)薄膜和6%摩尔%PMNN混合PZT(52/48)膜(6%PMNN-94%PZT(52/48)),因此它们两者在硅基板上外延生长,其中(111)取向。通过锯形塔电路研究薄膜的铁电,结果表明,PMNN的混合严重改善了PZT(52/48)的铁电,其中6%混合的PZT膜拥有其特性极化强度P_R = 23.7 μc/ m〜2,饱和偏振强度P_s =40μc/ m〜2和矫顽电场强度E_c = 139 kV / cm,其明显大于非混合的PZT(52/48)膜

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