Effect of Sputtering Parameters on Photocatalytic Activity of Anatase TiO_2 Films Deposited at Room Temperature

摘要

We have successfully deposited anatase TiO_2 thin films at room temperature on polycarbonate substrates by RF magnetron sputtering. Four deposition parameters including RF power, sputtering pressure, argon/oxygen ratio and deposition time were employed to realize the photocatalytic activities of TiO_2 films. The orthogonal array and analysis of variance (ANOVA) were adopted to determine the performance of the deposition process. The RF power was found to be the major factor affecting the photocatalytic properties. An increase in RF power could be improved the deposition rate, contact angle, and MB absorbance.