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Research on ZnS Buffer layer by RF Magnetron Sputtering for Cu(ln,Ga)Se_2 Solar Cells

机译:Cu(LN,GA)SE_2太阳能电池RF磁控溅射ZNS缓冲层的研究

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Nanocrystalline ZnS thin films are prepared on glass substrates under various deposition conditions (radio frequency power, and sputtering pressure) using radio frequency magnetron sputtering at room temperature. Through optimization of deposition process, very thin and uniform ZnS layer was deposited to minimize the light blocking effect in short wavelength region. This paper investigates the influence of ZnS buffer layer by magnetron sputtering,and analyses structure,surface topography,and optical properties of ZnS films by using X-ray diffraction (XRD), UV-spectroscopy measurements and scanning electronic microscope (SEM) analysis techniques. Findings show that the high-quality ZnS thin films with a good crystallinity and optical properties, which is zinc blende cubic structure with a preferred orientation, can be grown by sputtering at 300W and 0.6Pa. The films exhibit the optical transparency as high as 80% in the visible region, and the resultant ZnS thin films have a high crystallinity, low defect concentration and good optical properties with the band gap of 3.50eV.
机译:在室温下使用射频磁控溅射在各种沉积条件(射频功率和溅射压力)下在玻璃基板上制备纳米晶ZnS薄膜。通过优化沉积工艺,沉积非常薄的ZnS层以使短波长区域中的光阻挡效果最小化。本文通过磁控管溅射研究了ZnS缓冲层的影响,并通过使用X射线衍射(XRD),UV光谱测量和扫描电子显微镜(SEM)分析技术来分析ZnS膜的结构,表面形貌和光学性质。结果表明,具有良好结晶度和光学性质的高质量ZnS薄膜,其是具有优选取向的锌混合立方结构,可以通过以300W和0.6A溅射来生长。薄膜在可见区域中表现出高达80%的光学透明性,并且所得ZnS薄膜具有高结晶度,低缺陷浓度和具有3.50eV的带隙的良好光学性能。

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