Defect management with reticle-to-wafer correlations

摘要

• All use case study are completed in Klarity Reticle R2W proto type version • for inline control prospective, enable quick identification from repeaters to reticle defect • Optimization of reticle inspection & cleaning strategy • In product version, forward looking from reticle DOI to explore wafer is under developing • Critical reticle defect direct review • Progressive defect growth vs. Process Window Qualification