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Formation of Irregular At Islands by Room-Temperature Deposition on NiAI(HO)

机译:在NIAI(HO)上通过室温沉积形成不规则的岛屿

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STM studies reveal that irregular non-equilibrium two-dimensional Al islands form during deposition of Al on NiAl(110) at 300 K. These structures reflect the multiple adsorption sites and diffusion paths available for Al adatoms on the binary alloy surface, as well as the details of inhibited edge diffusion and detachment-attachment kinetics of Al adatoms for numerous distinct step edge configurations. We attempt to capture these features by multi-site lattice-gas modeling incorporating DFT energetics for adatoms both at adsorption sites and transition states. This formulation enables description and elucidation of the observed island growth shapes.
机译:STM研究表明,在300K的300k上沉积Al沉积Al期间的不规则非平衡二维Al岛形式。这些结构反映了二元合金表面上的Al Adatoms的多个吸附位点和可用于的扩散路径,以及用于多种不同的步骤边缘配置的Al Adatoms的抑制边缘扩散和分离连接动力学的细节。我们试图通过在吸附部位和转换状态下掺入DFT精力量的多网格 - 气体建模来捕获这些特征。该制剂能够描述和阐明观察到的岛生长形状。

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