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Growth Behavior of M-Plane ZnO Epilayer on (100) LiGaO_2 by Chemical Vapor Deposition

机译:用化学气相沉积(100)legaO_2的M平面ZnO癫痫术的生长行为

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摘要

The growth behavior of ZnO epilayer on (100) LiGaO_2 (LGO) substrates by chemical vapor deposition was studied. At 650°C or above, (10 1 0)-oriented ZnO epilayers were obtained. The epitaxial deposition of ZnO is, however, in competition with the volatilization of Li from the substrate surface. A discrete layer composed of ZnGa_2O_4 spinel nanocrystals is formed on the substrate surface. The (1010)-oriented ZnO grains, which nucleate epitaxially on the LGO substrate, have thus to grow laterally over the spinel nanocrystals to form a continuous epilayer.
机译:研究了ZnO癫痫素对(100)legaO_2(LGO)基质通过化学气相沉积的生长行为。在650℃或更高的情况下,获得(10 1 0)取代的ZnO脱蛋白。然而,ZnO的外延沉积在竞争中与来自基材表面的Li的挥发。由Znga_2O_4尖晶石纳米晶体组成的离散层形成在基板表面上。 (1010)的ZnO晶粒,其在LGO底物上外延上核心,从而使横向在尖晶石纳米晶体上生长以形成连续的外延。

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