The 2011 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (2011 FCMN) was held May 23-26, 2011, at the MINATEC Campus in Grenoble, France. This was the first time that the conference was held outside of the United States. It was formerly titled Characterization and Metrology for ULSI Technology. The 2011 FCMN was the eighth in a series that began in 1995 and emphasized the frontiers and innovation in characterization and metrology of nanoelectronics. It attracted participants from around the world to examine the latest advances in characterization and metrology that will help shape the future of the nanoelectronics revolution and will maintain the deflationary nature of the semiconductor industry; namely, increased functionalities at lower cost per function with each succeeding technology generation. The format of the 2011 FCMN allowed extended interactions between characterization and metrology experts and users from industry and R&D labs. By providing an opportunity for attendees to share results and interests, the conference facilitated new research partnerships and helped establish a common vision for meeting nanoelectronics characterization and metrology challenges. There were 156 attendees at the 2011 FCMN with 100 from Europe, 8 from Asia, 45 from the North America, and 3 for other regions.
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