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首页> 外文期刊>APL Materials >Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies
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Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies

机译:研究更新:三个M(材料,计量学和建模)共同为未来的纳米电子技术铺平了道路

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摘要

Recent discussions concerning the continuation of Moore's law have focused on announcements by several major corporations to transition from traditional 2D planar to new 3D multi-gate field effect transistor devices. However, the growth and progression of the semiconductor microelectronics industry over the previous 4 decades has been largely driven by combined advances in new materials, lithography, and materials related process technologies. Looking forward, it is therefore anticipated that new materials and materials technologies will continue to play a significant role in both the pursuit of Moore's law and the evolution of the industry. In this research update, we discuss and illustrate some of the required and anticipated materials innovations that could potentially lead to the continuation of Moore's law for another decade (or more). We focus primarily on the innovations needed to achieve single digit nanometer technologies and illustrate how at these dimensions not only new materials but new metrologies and computational modeling will be needed.
机译:关于摩尔定律延续性的最新讨论集中在几家主要公司宣布从传统2D平面过渡到新的3D多栅极场效应晶体管器件的公告上。然而,在过去的40年中,半导体微电子行业的发展和进步很大程度上是由新材料,光刻技术以及与材料相关的工艺技术的综合进步所推动的。因此,展望未来,可以预期,新材料和材料技术将继续在追求摩尔定律和行业发展中发挥重要作用。在本研究更新中,我们讨论和说明了一些必需的和预期的材料创新,这些创新可能会导致摩尔定律再延续十年(或更长时间)。我们主要关注实现一位数纳米技术所需的创新,并说明在这些方面如何不仅需要新材料,还需要新的计量学和计算模型。

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