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Surface corrugation and stacking misorientation in multilayers of graphene on Nickel

机译:在镍上堆积的石墨烯多层的表面波纹和堆叠杂乱

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Graphene films were grown on thin polycrystalline Ni using a buried amorphous carbon (a-C) layer as C source. Rapid thermal processes (RTP) at temperatures from 00 to 800°C were used to promote C diffusion into Ni and its subsequent segregation on Ni surface, during the sample cool down. RTP at 800°C was the optimal condition for graphene film formation. Micro-Raman spectroscopy showed that the grown film is mostly composed by multilayers of graphene. Atomic force microscopy showed that the film presents peculiar corrugations (wrinkles), isotropically oriented and with heights ranging from ~1 to ~15 nm. Selected area diffraction by transmission electron microscopy on the MLG membranes shows a rotational disorder between the stacked graphene layers.
机译:使用掩埋的无定形碳(A-C)层作为C源的薄多晶硅Ni生长石墨烯薄膜。在样品冷却期间,使用从00至800℃的温度下的快速热过程(RTP)促进C扩散和其随后的Ni表面上的偏析。 RTP在800℃下是石墨烯膜形成的最佳条件。微拉曼光谱表明,生长的膜主要由石墨烯多层组成。原子力显微镜显示,薄膜呈现特殊的波纹(皱纹),各向同性定向,高度范围为约1至〜15nm。通过MLG膜上的透射电子显微镜通过透射电子显微镜衍射显示堆叠的石墨烯层之间的旋转紊乱。

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