Effect of Annealing Temperature on the Structures and Properties of Thin Films

摘要

To investigate the effect of annealing temperature on the structures and properties of Bi_(4.15)Nd_(0.85)Ti_3FeO_(15) (BNTF), their thin films with four perovskite slabs were deposited on Pt/Ti/SiCVSi substrates by the metal-organic decomposition method. Good remanent polarization and excellent fatigue resistance were observed at room temperature. The BNTF thin films annealed at 780°C presented better ferroelectricity than those annealed at 700°C ~ 780°C. Ferromagnetic of BNTF thin films was not observed at room temperature.