Magnetic films that are uniform and less than 50 nm thick are required for various applications, such as micro electro mechanical systems (MEMSs) and magnetic recording systems (1-3). In addition, a specific application, magnetic force microscopy (MFM) probes requires thin magnetic films which are used to show magnetization states at the microscopic level (4). For obtaining such thin films with uniform thickness, an electrochemical deposition process is ideal. We fabricated bit patterned media (BPM) using electrochemical methods. For instance, we used electron beam lithography (EBL) and applied electroless deposition and electrodeposition to form BPM (5, 6). We also form BPM using nanoimprint lithography with UV curable resin or spin on glass (6, 7). In both case, CoPt was electrodeposited. In this study, we focused on the electroless deposition process. By using electroless deposition, we can obtain conformal deposition of metals with uniform structure in large area without consideration for distribution of current density.
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