首页> 外文会议>Lester Eastman Conference on High Performance Devices >S2-T3: Next generation gallium nitride HEMTs enabled by diamond substrates
【24h】

S2-T3: Next generation gallium nitride HEMTs enabled by diamond substrates

机译:S2-T3:由金刚石基板实现的下一代氮化镓垫圈

获取原文

摘要

This paper describes the thermal and electrical performance of GaN on Diamond devices, where the GaN on Diamond substrates are fabricated by taking epi from a host growth substrate and replacing it through direct growth of CVD diamond. We have found GaN on Diamond material improves thermal performance while maintaining electrical performance. This work demonstrates that GaN on Diamond technology can form the foundation of a next generation GaN device with 3X (or more) higher areal power density.
机译:本文介绍了金刚石装置上GaN的热电平和电气性能,其中通过从宿主生长衬底采取EPI并通过CVD金刚石的直接生长来制造金刚石基材上的GaN。 我们在钻石材料上找到了GaN,提高了热性能,同时保持电气性能。 这项工作表明,钻石技术上的GaN可以形成下一代GaN设备的基础,具有3x(或更多)更高的面功率密度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号