首页> 外文会议>Lester Eastman Conference on High Performance Devices >THE EFFECTS OF INCREASING AlN MOLE FRACTION ON THE PERFORMANCE OF AlGaN ACTIVE REGIONS CONTAINING NANOMETER SCALE COMPOSITIONALLY INHOMOGENEITIES
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THE EFFECTS OF INCREASING AlN MOLE FRACTION ON THE PERFORMANCE OF AlGaN ACTIVE REGIONS CONTAINING NANOMETER SCALE COMPOSITIONALLY INHOMOGENEITIES

机译:Aln Mole分数增加对纳米级组成不均匀性的AlGaN活性区域性能的影响

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In this paper we report on the characterization of n-Al0.51Ga 0.49N active regions and the fabrication of ultraviolet LEDs that contain self-assembled, nanometer-scale compositional inhomogeneities (NCI-AlGaN) with emission at ~290 nm. These active regions exhibit reduced integrated photoluminescence intensity and PL lifetime relative to 320 nm NCI-AlGaN active regions that have significantly lower AlN mole fraction, despite having more than an order of magnitude fewer threading dislocations, as measured by transmission electron microscopy. This behavior is attributed to nonradiative recombination associated with the presence of a larger density of point defects in the higher Al content samples. The point defects are ameliorated somewhat by the lower density of NCI AlGaN regions in the higher Al content samples, which leads to a larger concentration of carriers in the NCI and concomitant reduced radiative lifetime that may account for the high observed peak IQE (~ 25%). Prototype flip chip double heterostructure-NCI-ultraviolet light emitting diodes operating at 292 nm have been fabricated that employ a 50% NCI-AlGaN active region.
机译:在本文中,我们报告了N-Al0.51Ga 0.49N有源区的表征和紫外LED的制造,含有自组装的纳米级成分不均匀性(NCI-AlGaN),在〜290nm处发射。除了通过透射电子显微镜测量的,相对于320nc NCI-AlGaN有源区,这些活性区域相对于320nc NCI-AlGaN有源区具有显着降低的射线摩尔级分的320nc-AlGa-Alivations。这种行为归因于与较高Al含量样本中的较大点缺陷的存在相关的非接种性重组。点缺陷在较高的Al含量样本中的NCI AlGaN区域的较低密度稍微稍微改善,这导致NCI中较大的载体浓度,并且伴随可能考虑高观察到的峰值IQE(〜25%)的辐射寿命)。原型倒装芯片双异质结构-NCI-紫外线发光二极管,在292nm下工作,均采用50%NCI-AlGaN有源区。

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