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Growth, structure, surface topography and magnetic properties of GdMnO_3 multiferroic epitaxial thin films

机译:GDMNO_3多二二二型外延薄膜的生长,结构,表面形貌和磁性性能

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Epitaxial GdMnO_3 thin films were grown in various regimes on (001) NdGaO_3 and (001) SrTiO_3 substrates by RF magnetron sputtering. X-ray analysis revealed that the films grown at a substrate temperature of 650-900 °C are single phase (GdMnO_3 with orthorhombic Pbnm structure). Films grown on NdGaO_3 substrates at lower temperature (< 750 °C) have only one out-of-plane orientation, i.e. GdMnO_3(001)IINdGaO_3(001), whereas films grown at higher temperatures (? 750 °C ) reveal two orientations, i.e. GdMnO_3(001)IINdGaO_3(001) and GdMnO_3(l10)IINdGaO_3(001). These results are confirmed by transmission electron microscopy. Films grown on SrTiO_3 substrates have two orientations, i.e. GdMnO_3(001)IISrTiO_3(001) and GdMnO_3(l 10)||SrTiO_3(001), in the whole temperature range in which the phase exists. Using atomic force microscopy the correlation between the topography of the films and their crystallographic structure was studied. The magnetic properties of the films differ from those of bulk samples and revealed spin-glass behavior.
机译:通过RF磁控溅射在(001)NdgaO_3和(001)SRTIO_3基板上的各种制度中生长外延GDMNO_3薄膜。 X射线分析显示,在650-900℃的基板温度下生长的薄膜是单相(GDMNO_3,具有正交PBNM结构)。在较低温度(<750℃)下在NdGaO_3底物上生长的薄膜仅具有一个外平面取向,即GDMNO_3(001)IINDGAO_3(001),而在较高温度下生长的薄膜(? 750°C)显示两个取向,即GDMNO_3(001)iINDGAO_3(001)和GDMNO_3(L10)IINDGAO_3(001)。这些结果通过透射电子显微镜确认。在SRTIO_3基板上生长的薄膜具有两个取向,即GDMNO_3(001)IISRTIO_3(001)和GDMNO_3(L10)|| SRTIO_3(001),在相位存在的整个温度范围内。使用原子力显微镜检查膜的形貌与其晶体结构之间的相关性。薄膜的磁性与散装样品的磁性不同,并显示出旋转玻璃行为。

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