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Growth rate dependence of the extrinsic magnetic properties of electrodeposited CoPt films

机译:电沉积COPT薄膜外部磁性性能的生长速度依赖性

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The magnetic properties and the magnetization process of electrodeposited thick films of Co-rich CoPt alloys are studied with particular emphasis on the effects of growth rate, controlled by varying the plating current density, and of lateral confinement, analyzing patterned micro-cylinders. We find that varying the plating current density has virtually no effect on the composition of the samples, and hence on the intrinsic magnetic properties, a substantial increase of both coercivity and squareness is obtained when the current is raised. The films are fine-grained, oriented polycrystals with typical grain sizes in the range 50-150 nm, depending on the growth rate. The complex magnetization process is studied in detail by Magnetic Force Microscopy and shown to be governed by interaction domains. It is shown that further improvement of the squareness can be obtained by exploiting the lateral confinement in patterned samples.
机译:通过改变电流密度和横向限制来研究电沉积的Copt合金电沉积厚膜的磁性和磁化过程,特别强调了通过改变电镀电流密度和侧向限制来控制的生长速率。我们发现,改变电镀电流密度几乎没有对样品的组成作用,因此在内在磁性上,当电流升高时,获得矫顽力和正方形的显着增加。薄膜是细粒度的,导向的多晶,其典型的粒度范围为50-150nm,这取决于生长速率。通过磁力显微镜进行详细研究复杂的磁化过程,并显示通过相互作用域来控制。结果表明,通过利用图案化样品中的横向限制,可以进一步改善正方形。

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