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Asymmetric Bipolar Pulsed Power Based on DSP for Magnetron Sputtering

机译:基于DSP的非对称双极脉冲功率,用于磁控溅射

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摘要

In order to meet the requirements of the magnetron sputtering, an asymmetric bipolar pulsed power supply based on DSP is presented in this paper. It can freely adjust the pulse parameters including pulse amplitude, frequency, duty cycle, and even the number and transition time of the positive and negative pulse according to the sputtering demands. Finally, a 5kW/ 100kHz prototype is designed. It adopts two isolated DC/DC converters as the current source, and an asymmetric pulses generator. The digital signal processor (DSP) fulfills the digital closed loop control of current sources. Meanwhile, it achieves the adjustment of pulse segment. The experimental results verify the designed.
机译:为了满足磁控溅射的要求,本文提出了基于DSP的非对称双极脉冲电源。它可以根据溅射需求自由调节包括脉冲幅度,频率,占空比的脉冲参数,频率,占空比,甚至是正脉冲的数量和转变时间。最后,设计了5kW / 100kHz原型。它采用两个隔离的DC / DC转换器作为电流源,也是不对称的脉冲发生器。数字信号处理器(DSP)满足当前源的数字闭环控制。同时,它达到了脉冲段的调整。实验结果验证了设计的。

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