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Enabling Wafer Level Processes for CIS Manufacturing

机译:启用CIS制造的晶圆级流程

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CMOS (Complimentary Metal Oxide Semiconductor) Image Sensors have become ubiquitous, appearing in cars, cell phones, toys and various other devices used in every day life. The primary reason for this increasing presence of CIS (CMOS Image Sensors) is the continual improvement of the performance to cost ratio of these devices. This overall improvement is driven both by improvements in the CIS itself and improvements in how this CIS is incorporated in a camera module. Numerous process developments related to both the electrical and optical aspects of 3D packaging of CIS that have enabled this climb up the performance vs. cost curve will be reviewed in this paper with particular attention to: (1) Lens molding – The ability to mold lenses, both spherical and aspherical at the wafer level as well as make full size master stamps from partial masters for lens molding. These lenses can be molded on both sides of a wafer and the lenses aligned to each other; (2) Aligned wafer bonding for optical interconnects consisting of lens stacks and CIS wafer, to allow the thinning of a CIS for BSI (back side illumination), and for electrical interconnects. Together these processes allow the heterogeneous integration of optical and electrical elements at the wafer level and advance the CIS up the performance vs. cost curve.
机译:CMOS(互补金属氧化物半导体)图像传感器已经变得无处不在,出现在汽车,手机,玩具和各种日常生活中使用的其他设备。这种增加了CIS(CMOS图像传感器)的主要原因是对这些设备的成本比的性能的连续提高。这种整体改进是通过CIS本身的改进而导致的,并且该CI如何在相机模块中结合在一起。众多流程开发与CIS的3D包装的电气和光学方面相关,这爬上了这种攀登的性能与成本曲线。在本文中将特别注意:(1)镜头成型 - 模塑镜片的能力,晶圆水平的球形和非球面以及从部分主体制造镜头成型的全尺寸主邮票。这些透镜可以在晶片的两侧模制,镜头彼此对齐; (2)对准由透镜堆叠和顺式晶片组成的光学互连的对准晶片键合,以允许BSI(背面照明)和电互连的CIS变薄。这些过程共同允许光学和电气元件在晶片水平上的异质整合,并提前顺应表现比率与成本曲线。

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